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Positive ions carry a substantial fraction of the total discharge current in the cathode fall. (34,59) At typieal discharge voltages, collisions between ions and atoms will tend to be e1astic, so that no energy will be lost through excitation. x. ~ 0·8 '0 r:: o 0< ~ 0·4 ... a « A (cm) Figure 2-14. ) major source of energy loss will be through symmetric charge exchange. (60) The produced thermal ion then is accelerated by the fraction of the fall potential existing between that point and the cathode.
Major, and A. L. Forster, Appl. Spectrosc. 37 (1983) 41l. G. Tölg, Analyst 112 (1987) 365. W. Slavin, Spectroscopy 6(8) (1991) 16. R. Bock, A Handbook 0/ Decomposition Methods in Analytical Chemistry, Wiley, New York, 1979. H. M. Kingston and L. B. , 1988. G. M. Hieftje, Fresenius Z. Anal. Chem. 337 (1990) 528. J. D. Ingle and S. R. Crouch, Spectrochemical Analysis, p. , 1988. A. M. Y. 1976. B. Chapman, Glow Discharge Processes, Wiley-Interscience, New York, 1980. Analytical Atomic Spectrometry: Use and Exploration of Low Pressure Discharges (P.
Wehner(31) has shown, though, that there is a more complex relationship than explained 3·0 • c:0 "E E 2·0 S "0 Gi '", 0> 'E .!! 5 Cf) 1·0 1000 Threshold energy (Er) Ion energy (eV) Figure 2-7. Effect of incident ion energy on sputter yield; Cu target, Ar ions. (34) 31 FUNDAMENTAL PLASMA PROCESSES by simple mass considerations. Figure 2-8 is a compilation of the sputter yields obtained for various elements under sputtering conditions close to those found in glow discharge devices, 400-eV Ar+. The author found that the sputter yields seem to vary according to the d-shell filling.