By Stefan Sinzinger, Jürgen Jahns
Microoptics is a crucial allowing know-how for lots of components of program. during this up to date moment variation in their smooth textual content and reference e-book, Stefan Sinzinger and Jürgen Jahns expertly and comprehensively current the fundamentals and purposes in microoptics, whereas incorporating an important advancements lately. An absolute needs to for physicists and electric engineers, from complex scholars correct as much as designers operating within the box.
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Example text
The k-vectors kout ) of the rays. Alternatively the k-vectors (kcomp ) due to the component can be calculated from the phase profile. These vectors kcomp are added to the k-vectors of the incident rays (kin ) to yield the new propagation directions (kout ). 8) After a series of propagation steps and planes with optical components, we find the points where the optical rays are incident on the observation plane. An evaluation of the resulting pattern yields the performance of the optical system. In the first approximation, the ray tracing analysis is a geometrical method, which does not consider diffractive effects.
Malacara, “Optical shop testing”, John Wiley & Sons, New York (1992). V. Gerbig and A. W. ”, Appl. Opt. 28 (1989), 5198–5199. N. Bareket, “Second moment of the point spread function as an image quality criterion”, J. Opt. Soc. Am. 69 (1979), 1311–1312. M. Born and E. Wolf, “Principles of Optics”, 7th (expanded) edition, Cambridge University Press (1999). R. Barakat, “Rayleigh wavefront criterion”, J. Opt. Soc. Am. 55 (1965), 572–573. W. B. King, “Dependence of the Strehl ratio on the magnitude of the variance of the wave aberration”, J.
2 μs. In this case the e-beam machine takes about 1 12 days to expose the whole pattern. For comparison, with the laser writing system an illumination of the whole image field consisting of only 1010 pixels takes about 3 12 –4 12 hours. In order to apply e-beam writing in mask or scanning lithography efficiently it is essential to reduce the writing time for the patterns. The approaches to achieve this goal are twofold: New photoresists are developed which are more sensitive to the e-beam radiation and allow shorter illumination times.