By Uzodinma Okoroanyanwu
This ebook is a unified exposition of the molecular thought that underlies lithographic imaging. It explains with physical-chemical theories the molecular-level interactions occupied with lithographic imaging. It additionally offers the theoretical foundation for the most unit operations of the complex lithographic strategy, in addition to for complex lithographic imaging mechanisms, together with photochemical and radiochemical, imprint, and directed block copolymer self-assembly imaging mechanisms. The publication is meant for scholar and execs whose wisdom of lithography extends to the chemistry and physics underlying its a number of types. A familiarity with chemical kinetics, thermodynamics, statistical mechanics, and quantum mechanics could be priceless, as can be familiarity with common strategies in physics resembling strength, strength, electrostatics, electrodynamics, and optics.
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C. Liu, J. T. Christopher, P. A. Rincon Delgadillo, C. S. W. Craig, P. F. Nealey, and R. Gronheid, “Towards an all-track 300 mm process for directed self-assembly,” J. Vac. -C. Liu, E. Han, M. S. Onses, C. J. Thode, S. Ji, P. Gopalan, and P. F. Nealey, “Fabrication of lithographically defined chemically patterned polymer brushes and mats,” Macromolecules 44(7), 1876–1885 (2011). 75. J. Y. Cheng, D. P. Sanders, H. D. Truong, S. Harrer, A. Friz, S. Holmes, M. Colburn, and W. D. Hinsberg, “Simple and versatile methods to integrate directed self-assembly with optical lithography using a polarity-switched photoresist,” ACS Nano 4(8), 4815–4823 (2010).
S. Nonogaki, T. Ueno, and T. Ito, Microlithography Fundamentals in Semiconductor Devices and Fabrication Technology, Marcel Dekker, New York, p. 133 (1998). 2. ibid. 3. R. H. Collins and F. T. S. Patent No. 3,549,368 (1970). 4. HMDS is a colorless liquid that boils at 125 °C. 1]). In this reaction, HMDS acts as a silane-coupling agent that converts hydrophilic silanol groups on the surface into hydrophobic siloxanes. CH3 OH 2 Si + HN Si CH3 CH3 Δ CH3 2 H3C Si CH3 + NH3 O 2 Si Hydroxylated silicon wafer surface (hydrophilic ) HMDS (adhesion promoter) HMDS-primed wafer surface (hydrophobic) ½2:1 Normally, this silyl ether formation reaction is base catalyzed and requires the addition of, for example, an amine to proceed, unless the reagent contains its own base, as is the case with HMDS.
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