By Maurice H. Francombe, John L. Vossen
This most up-to-date quantity of the well known Physics of skinny Films sequence comprises 4 chapters that debate high-density plasma resources for fabrics processing, electron cyclotron resonance and its makes use of, unbalancedmagnetron sputtering, and particle formation in skinny movie processing plasma.
- Chapter One develops a unified framework from which all "high-efficiency" resources can be seen and in comparison; outlines key parts of resource layout affecting processing effects; and highlights parts the place extra examine and improvement are needed
- Chapter stories and analyzes the most kinds of electron cyclotron resonance (ECR) plasma assets compatible for ECR PACVD of skinny movies, in general ECR resources utilizing magnet coils
- Chapter 3 examines the advantages and boundaries of the hot strategy, unbalanced magnetron sputtering (UBM), in addition to the inducement for its improvement, the fundamental rules of its operation and advertisement purposes, and a few speculations concerning the way forward for UBM technology
- Chapter 4 describes basic phenomena saw in reference to particle formation in skinny movie processing plasmas; discusses debris in PECVD plasmas, sputtering plasmas, and RIE plasmas; provides an summary of the theoretical modeling of varied points of debris in processing plasmas; examines problems with gear layout affecting particle formation; and concludes with feedback concerning the implications of this paintings for the keep watch over of process-induced particle contamination
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Additional resources for Plasma Sources for Thin Film Deposition and Etching
Example text
For high densities and magnetic fields (œpe,œce » ω) and propagation at an angle to the magnetic field, the dispersion equation reduces to that of whistler waves (Ref. 126, p. 55): kkjkl = œlJœœce, (43) where k = (k\ + k ) is the wave vector magnitude and k± and kz are the radial and axial components. Choosing The multidipole, distributed ECR system shown in Fig. 12e is powered by microwave injection perpendicular to the strong, permanent magnet, multidipole magnetic fields. Typically, four or more microwave applicators are arranged around the circumference to achieve adequate uniformity (121). Each applicator creates an approximately linear resonance zone near the process chamber wall as shown. A microwave cavity source is shown in Fig. 12f. The coaxial feed is tuned using a sliding short on top and a stub tuner from the side (3,5). D. L O W - D E N S I T Y O P E R A T I O N A N D S O U R C E EFFICIENCY Since the dc conductivity σ oc n 0 , and δρ oc rcô , it is apparent from (75) and (76) that at fixed driving current 7 r f , we have the scaling 1/2 Pabs^"0 1 / 2 . (79) However, at low densities, such that δρ » R, the conductivity is low and the fields fully penetrate the plasma. In this case, applying Faraday's law to determine the induced electric field Εθ within the coil, we obtain Ee(r) = \]ωνμ0ηΙτίΙΙ^ and, writing J = jcos0KpE for v c « ω, we have J oc n0rlr{.